Cambs, United Kingdom

Roger F Sewell

This inventor holds 1 USPTO granted patent. Top assignee: Danfoss A/s. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roger F Sewell. Retrieved from https://idiyas.com/inventor/roger-f-sewell

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Innovations of Roger F Sewell

Introduction

Roger F Sewell is a notable inventor based in Cambs, GB. He has made significant contributions to the field of flow measurement technology. His innovative approach has led to the development of a unique circuit arrangement that enhances the accuracy and efficiency of flow meters.

Latest Patents

Roger F Sewell holds a patent for a "Circuit arrangement for deriving the measured variable from the signals of sensors of a flow meter." This invention involves a sophisticated circuit that processes signals from multiple sensors in a flow meter. The design aims to minimize errors and improve measurement reliability by utilizing digital processing techniques.

Career Highlights

Roger is associated with Danfoss A/S, a company known for its advanced engineering solutions. His work focuses on creating technologies that optimize fluid dynamics and measurement systems. With a patent portfolio that includes 1 patent, he has established himself as a key player in the industry.

Collaborations

Throughout his career, Roger has collaborated with esteemed colleagues such as Henning M Hansen and Frands W Voss. These partnerships have fostered innovation and contributed to the advancement of flow measurement technologies.

Conclusion

Roger F Sewell's contributions to the field of flow measurement through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and improve measurement accuracy.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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