Company Filing History:
5 out of 40,850 
1 out of 1,615 
Years Active: 2000-2024
Title: Roger Chen - Innovator in Lithography Technologies
Introduction
Roger Chen is a prominent inventor based in Hsinchu, Taiwan, known for his significant contributions to the field of lithography. With a total of six patents to his name, Chen's work focuses on advancing the technologies used in the semiconductor manufacturing process.
Latest Patents
One of Chen's latest innovations is the patent for "Multiple-mask multiple-exposure lithography and masks." This invention outlines various examples of a multiple-mask multiple-exposure lithographic technique that utilizes specific masks. In these examples, a photomask is detailed to include a die area alongside a stitching region positioned adjacent to it. This stitching region contains crucial elements such as a mask feature intended for forming integrated circuit features and an alignment mark for precise in-chip overlay measurement. These advancements are essential for enhancing the accuracy and efficiency of semiconductor fabrication processes.
Career Highlights
Throughout his career, Roger Chen has made notable impacts while working with leading companies in the semiconductor industry. He has held positions at Taiwan Semiconductor Manufacturing Company Ltd. and Novatek Microelectronics Corporation, where his expertise has been instrumental in driving innovation.
Collaborations
In his professional journey, Chen has collaborated with esteemed colleagues such as Peter Yu and Chih-Tung Hsu. These partnerships have fostered an environment of innovation and progress within the semiconductor sector, allowing for the development of cutting-edge technologies.
Conclusion
Roger Chen continues to be a key figure in the evolution of lithography technologies, with his patents serving as an influential foundation for future advancements in semiconductor manufacturing. His work exemplifies the spirit of innovation, driving progress in an industry that is vital to modern technology.