Taiwan Semiconductor Manufacturing Comp. Ltd.

Novatek Microelectronics Corp.

Roger Chen

Chih-Chia Hu

Chih-Tung Hsu

Peter Yu

Kevin Wang

Dean Jau

Edward Tsai

Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Multiple-mask multiple-exposure lithography and masks

An electromagnetic safety (EMS) enhancement circuit is provided for a USB (Universal Serial Bus) system, which can simulate an unplugging and replugging action so as to ensure continuous operation of the USB device after being disconnected from the USB interface due to electromagnetic interferences. The EMS enhancement circuit utilizes an EMS detection unit to detect the EMS condition of the data communication between the USB device and the USB interface; if abnormal, the EMS detection unit will output an overflow signal to a resume-control unit. The resume-control unit can output a pull-up control signal to a voltage pull-up circuit so as to control the voltage pull-up circuit in such a manner that, when the USB device is disconnected from the USB interface, the voltage pull-up circuit is first inhibited from outputting a voltage signal to one data line of the USB interface to thereby simulate an unplugging action and, after a preset time, be enabled again to output the voltage signal to thereby simulate a replugging action. The simulated unplugging and replugging action can then automatically reconnect the USB device to the USB interface for continuous operation of the USB device.

Electromagnetic safety enhancement circuit for universal serial bus

Growing community of inventors

Hsinchu, Taiwan

Roger Chen