Company Filing History:
Years Active: 2020
Title: Roee Sulimarski: Innovator in Optical Metrology
Introduction
Roee Sulimarski is a notable inventor based in Haifa, Israel. He has made significant contributions to the field of optical metrology, particularly through his innovative methods that enhance measurement accuracy. His work is characterized by a deep understanding of the complexities involved in metrology and process variations.
Latest Patents
Roee Sulimarski holds a patent for a method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology. This patent outlines methods for deriving a partially continuous dependency of metrology metrics on recipe parameters. It also discusses how to analyze this dependency and determine a metrology recipe based on the analysis. The patent emphasizes the importance of sensitivity landscapes, where regions of low sensitivity and points of low or zero inaccuracy are identified. This analysis is crucial for optimizing measurements and making metrology more robust and flexible.
Career Highlights
Roee Sulimarski is currently employed at Kla Corporation, a leading company in the field of metrology and semiconductor manufacturing. His work at Kla Corporation has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in measurement technologies.
Collaborations
Roee has collaborated with talented individuals such as Tal Marciano and Barak Bringoltz. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge solutions in metrology.
Conclusion
Roee Sulimarski is a distinguished inventor whose work in optical metrology has the potential to significantly improve measurement accuracy in various applications. His innovative methods and collaborative spirit continue to drive advancements in the field.