Company Filing History:
1 out of 164,197 
1 out of 52 Years Active: 1996-2007
Title: Robin Lynn Almes: A Pioneer in Advanced Mask and Wafer Processing Technologies
Introduction
Robin Lynn Almes, based in Sunnyvale, California, is a notable inventor with a keen focus on innovations in mask and wafer processing technologies. Holding two patents, his work showcases his expertise and contribution to the field, particularly in the domains of disk drive slider assemblies and photo-definition processes.
Latest Patents
Almes' latest patents reflect his innovative approach to engineering. The first patent, titled "System and method for charge-balanced, continuous-write mask and wafer process for improved colinearity," introduces a groundbreaking process that enhances the magneto-resistive photo-definition step through a two-mask step operation. This method allows for critical images to be written using a small electron beam spot size, while non-critical images utilize a larger spot size. Both mask layers are integrated onto a single glass substrate, ensuring that the critical images are positioned with utmost accuracy.
His second patent, "Sacrificial structure masking method for disk drive slider assemblies," details a technique for creating pico-sized air bearing surfaces for sliders. This method involves mounting parallel slider rows into a carrier and positioning a mask with sacrificial structures to establish the air bearing surfaces. The innovative process allows for precise etching and cutting, resulting in individual sliders without any remnants of the sacrificial structures on the surface.
Career Highlights
Throughout his career, Almes has contributed his expertise to several prominent organizations. Notably, he worked with IBM and Hitachi Global Storage Technologies, where he was instrumental in developing cutting-edge technologies in data storage and processing.
Collaborations
Almes has collaborated with several renowned professionals in his field, including Laurence S Samuelson and Michael J Murtagh. These collaborations have further enriched his inventions and contributed to advancements in the industry.
Conclusion
Robin Lynn Almes stands out as an innovative force in the realm of mask and wafer processing technologies. His patents reveal a dedication to enhancing engineering techniques, significantly impacting the development of storage technologies. As a pioneering inventor, Almes continues to inspire future innovations within the field.