International Business Machines Corporation

Hitachi Global Storage Technologies

Robin Lynn Almes

Mark Anthony Church

Laurence S Samuelson

Benjamin Lu Chen Wang

Jiunn Tsay

Mary Kathyrn Gutberlet

Michael J Murtagh

A charge-balanced, continuous-write mask and wafer process changes the magneto resistive photo-definition step to a two-mask step operation. Critical images are written on one mask layer at a very small electron beam spot size, and non-critical images are written on a second mask layer at a relatively larger electron beam spot size. Both mask layers are put onto the same glass substrate where the critical mask layer is located at the most accurate position on the substrate. The non-critical images may be placed in a peripheral field. In wafer processing, the critical field is aligned and exposed onto the wafer and then the non-critical field is aligned and exposed.

System and method for charge-balanced, continuous-write mask and wafer process for improved colinearity

A sacrificial structure masking method for disk drive slider assemblies. Pico size air bearing surfaces (ABS) for sliders are created by mounting parallel slider rows into a carrier. The ABS are then established by positioning a mask having a sacrificial structure within the slider area, over the carrier and/or along cut zones between individual sliders. Once the masks are positioned, the carrier is exposed to transfer the pattern to the slider rows. The mask is then removed and the exposed area is etched from the slider rows. After the etching process, the masked portion of the slider is raised slightly to form the air bearing surfaces. Where a rear sacrificial structure is positioned over the carrier, no remnant is left on the slider surface after the etching step. However, sacrificial structures positioned within the slider area must be removed by a subsequent process step. The slider rows are then cut to form individual sliders. Slider features can also be formed by placing the sacrificial structures solely over the carrier and along the slider cut zones. The sacrificial structures along the cut zones are removed by the cutting process.

Sacrificial structure masking method for disk drive slider assemblies

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Sunnyvale, CA, United States of America

Robin Lynn Almes