This inventor holds 1 USPTO granted patent. Top assignee: Beneq Oy. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: Robin Enholm: Innovator in Substrate Processing Technology
Introduction
Robin Enholm is a notable inventor based in Helsinki, Finland. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique apparatus designed to enhance surface reactions on substrates.
Latest Patents
Enholm holds a patent for an "Apparatus for processing surface of substrate and nozzle head." This invention relates to an apparatus and nozzle head that processes the surface of a substrate. The apparatus features a substrate support mechanism that holds the substrate on a support plane within a process zone. It also includes a nozzle head that subjects the substrate's surface to successive reactions involving at least two precursors. The nozzle head support mechanism maintains the nozzle head at a predetermined distance from the substrate support plane, ensuring precision in the processing.
Career Highlights
Robin Enholm is associated with Beneq Oy, a company known for its advancements in thin film technology. His work at Beneq Oy has allowed him to apply his innovative ideas in a practical setting, contributing to the company's reputation in the industry.
Collaborations
Throughout his career, Enholm has collaborated with esteemed colleagues such as Leif Keto and Pekka T Soininen. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
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Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile