The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2017
Filed:
Jun. 24, 2013
Applicant:
Beneq Oy, Espoo, FI;
Inventors:
Assignee:
BENEQ OY, Espoo, FI;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/458 (2013.01); C23C 16/45525 (2013.01); C23C 16/45551 (2013.01); C23C 16/45563 (2013.01); C23C 16/45574 (2013.01); C23C 16/45587 (2013.01); C23C 16/54 (2013.01); C23C 16/545 (2013.01);
Abstract
The invention relates to an apparatus and nozzle head for processing a surface of a substrate. The apparatus includes a substrate support mechanism for supporting the substrate on a substrate support plane in a process zone, a nozzle head for subjecting the surface of the substrate to successive surface reactions of at least a first precursor and a second precursor and a nozzle head support mechanism for supporting the nozzle head at a predetermined distance from the substrate support plane. The nozzle head support mechanism includes a nozzle head support surface and, that the nozzle head is supported to the nozzle head support surface.