Quakertown, PA, United States of America

Roberto John Rovito

This inventor holds 9 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignees: Air Products and Chemicals, Inc., Ashland, Inc.. Active years: 2003-2014.

USPTO Granted Patents = 9 (Patent Applications = 1)

% Patents Active = 44.4

EPO Patents = 2

Average Co-Inventor Count = 2.3

ph-index = 5

Forward Citations = 68(Granted Patents)

Company Filing History:

8 out of 3,218

Air Products and Chemicals, Inc.

Years Active: 2003-2014

Loading Chart...

9 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8772214 - Aqueous cleaning composition for removing residues and method using same (2014-07-08),

2. 7888302 - Aqueous based residue removers comprising fluoride (2011-02-15),

3. 7879782 - Aqueous cleaning composition and method for using same (2011-02-01),

4. 7807613 - Aqueous buffered fluoride-containing etch residue removers and cleaners (2010-10-05),

5. 7682458 - Aqueous based residue removers comprising fluoride (2010-03-23),

6. 7534753 - pH buffered aqueous cleaning composition and method for removing photoresist residue (2009-05-19),

7. 6821352 - Compositions for removing etching residue and use thereof (2004-11-23),

8. 6677286 - Compositions for removing etching residue and use thereof (2004-01-13),

9. 6656894 - Method for cleaning etcher parts (2003-12-02),

Title: The Innovative Contributions of Roberto John Rovito

Introduction

Roberto John Rovito is a notable inventor based in Quakertown, PA (US). He has made significant contributions to the field of aqueous cleaning compositions, holding a total of 9 patents. His work focuses on developing methods and compositions for effectively removing residues from substrates, particularly in the semiconductor industry.

Latest Patents

Rovito's latest patents include innovative solutions such as an aqueous cleaning composition for removing residues and a composition and method for selectively removing residues like post-etched and post-ashed photoresist. One of his notable inventions describes a method for removing residues from a substrate by using a composition that includes water, a quaternary ammonium hydroxide compound, and a fluoride-containing compound, all while being free of added organic solvents and maintaining a pH greater than 9. Another patent details a composition for removing residues with a pH ranging from about 2 to about 9, which includes a buffer solution and is also substantially free of added organic solvents.

Career Highlights

Throughout his career, Rovito has worked with prominent companies such as Air Products and Chemicals, Inc. and Ashland, Inc. His experience in these organizations has allowed him to refine his expertise in developing cleaning compositions that are both effective and environmentally friendly.

Collaborations

Rovito has collaborated with notable colleagues, including Aiping Wu and David Barry Rennie. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Roberto John Rovito's innovative work in aqueous cleaning compositions has made a significant impact in the field of residue removal. His contributions continue to influence the industry and pave the way for future advancements.