San Jose, CA, United States of America

Robert William Hitzfield

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Robert William Hitzfield. Retrieved from https://idiyas.com/inventor/robert-william-hitzfield

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 52(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Robert William Hitzfield and His Rotary Plating Invention.

Introduction

Robert William Hitzfield is an inventor associated with San Jose, California, and International Business Machines Corporation. His patent work addresses the challenge of achieving more uniform plating across a workpiece’s surface.

Latest Patents

Hitzfield is credited with 1 patent: “Rotary Plater with Radially Distributed Plating Solution.” The invention describes a rotary plating system in which a solution-distribution device sits between the anode and cathode in a plating cup. A motor rotates the cathode and distribution device relative to one another. The device distributes plating solution at a rate that increases toward the outer edge of the plating surface, enriching that region with ions and helping improve plating uniformity.

Career Highlights

Hitzfield’s patent reflects an engineering approach to controlling how plating solution reaches different areas of a workpiece. By increasing the solution’s distribution rate radially outward, the design aims to address uneven plating at the surface’s periphery.

Collaborations

Hitzfield’s listed coworkers include Andrew Chiu and Wen-Chien David Hsiao. The patent’s technical focus is on a plating system designed to improve the consistency of the finished surface.

Conclusion

Robert William Hitzfield’s patented rotary plater uses radially adjusted solution distribution to promote more uniform plating across a workpiece.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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