Robert S K Chau

Title: Innovations of Robert S K Chau in Oxide Layer Formation

Introduction

Robert S K Chau is an accomplished inventor based in Beaverton, OR (US). He is known for his significant contributions to the field of semiconductor technology. His innovative work focuses on the formation of thin oxide layers, which are crucial in various electronic devices.

Latest Patents

One of Robert S K Chau's notable patents is titled "Process for forming a thin oxide layer." This patent discloses a novel process for forming a robust, sub-100 Å oxide. The method involves tightly controlling native oxide growth by flowing pure nitrogen during wafer push and nitrogen with a small amount of oxygen during temperature ramp and stabilization. Initially, a dry oxidation is performed in oxygen and 13% trichloroethane. Following this, a wet oxidation in pyrogenic steam is conducted to achieve a total oxide thickness of approximately 80 Å. The oxide layer formed is ideally suited for use as a high integrity gate oxide below 100 Å. This invention is particularly beneficial in devices with advanced, recessed field isolation where sharp silicon edges are challenging to oxidize. For oxide layers exceeding 100 Å, a composite oxide stack is utilized, comprising 40-90 Å of pad oxide formed using the aforementioned novel process, along with 60-200 Å of deposited oxide.

Career Highlights

Robert S K Chau is currently employed at Intel Corporation, where he continues to push the boundaries of semiconductor technology. His work has garnered attention for its potential applications in enhancing device performance and reliability.

Collaborations

Throughout his career, Robert has collaborated with notable colleagues, including William L Hargrove and Leopoldo D Yau. These collaborations have contributed to the advancement of innovative technologies in the semiconductor industry.

Conclusion

Robert S K Chau's contributions to the field of semiconductor technology, particularly in the formation of thin oxide layers, highlight his role as a leading inventor. His innovative processes are paving the way for advancements in electronic devices.