Vermontville, MI, United States of America

Robert Rechenberg

This inventor holds 2 USPTO granted patents. Top assignees: Fraunhofer USA, Inc., Michigan State University. Active years: 2020-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Robert Rechenberg. Retrieved from https://idiyas.com/inventor/robert-rechenberg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.5

ph-index = 1


Company Filing History:


Years Active: 2020-2025

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2 patents (USPTO):Explore Patents

Title: Innovation Spotlight: The Inventor Robert Rechenberg

Introduction: Meet the innovative mind behind groundbreaking technology, Robert Rechenberg, hailing from Vermontville, Michigan. With a keen focus on creating impactful solutions, his work has revolutionized the field of sensor technology.

Latest Patents: Robert Rechenberg's notable patent is the "Hybrid diamond-polymer thin film sensors and fabrication method." This implantable device features a flexible polymeric substrate that anchors through an aperture in electrically conductive material. The fabrication methods for this device are paving the way for advancements in medical technology.

Career Highlights: Throughout his career, Robert Rechenberg has been associated with esteemed institutions such as Michigan State University and Fraunhofer USA, Inc. His contributions have not only enriched the research landscape but have also led to practical applications in the industry.

Collaborations: In his professional journey, Robert Rechenberg has collaborated with skilled individuals like Wen Li and Bin Fan. Together, they have synergized their expertise to drive innovation and bring cutting-edge solutions to the forefront.

Conclusion: Robert Rechenberg's inventive spirit and dedication to advancing sensor technology have left an indelible mark on the field. His work continues to inspire future generations of inventors, paving the way for a more connected and technologically advanced world.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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