Glen Allen, VA, United States of America

Robert Ploessl


Average Co-Inventor Count = 1.7

ph-index = 4

Forward Citations = 77(Granted Patents)


Location History:

  • Fishkill, NY (US) (1999)
  • Glen Allen, VA (US) (1999 - 2000)
  • Glen Allen, VT (US) (2000)
  • Ithaca, NY (US) (2005)

Company Filing History:


Years Active: 1999-2005

where 'Filed Patents' based on already Granted Patents

6 patents (USPTO):

Title: **Robert Ploessl: Innovator in Semiconductor Fabrication**

Introduction

Robert Ploessl, based in Glen Allen, VA, is an accomplished inventor with a significant contribution to the field of semiconductor fabrication. With a total of six patents to his name, Ploessl's innovations primarily focus on enhancing the efficiency and effectiveness of semiconductor processing techniques.

Latest Patents

Ploessl's most recent patent details a metal chemical polishing process designed to minimize dishing during the fabrication of semiconductor wafers. This innovative two-step chemical mechanical polishing (CMP) process plays a critical role in reducing defects within metal lines in trenches formed in insulation layers of semiconductor wafers. In the first step, a metal layer on the oxide layer undergoes bulk removal to create a minimized remainder without affecting the metal lines in the trenches. The subsequent step employs a clean polishing pad, ensuring reduced dishing and clearer delineation of individual metal lines. Additionally, he has developed an improved hard mask aimed at reducing pad erosion during semiconductor fabrication, incorporating an etch stop layer between two hard mask layers.

Career Highlights

Throughout his career, Ploessl has worked with esteemed organizations such as Siemens Aktiengesellschaft and International Business Machines Corporation (IBM). His experiences at these prominent companies have greatly influenced his innovative mindset and patentable ideas.

Collaborations

Robert Ploessl has collaborated with notable colleagues, including Chenting Lin and Bertrand Flietner. These partnerships have undoubtedly enriched his research and contributed to the successful development of his patented technologies.

Conclusion

Robert Ploessl has established himself as a key figure in the semiconductor industry through his innovative approaches to fabrication processes. With multiple patents demonstrating his expertise and commitment to improvement, Ploessl continues to influence the future of semiconductor technology, making strides that are essential to the advancement of this critical field.

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