The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2000
Filed:
Dec. 28, 1997
Applicant:
Inventors:
Bertrand Flietner, Hopewell Junction, NY (US);
Robert Ploessl, Glen Allen, VT (US);
Monika Gschoederer, Wappingers Falls, NY (US);
Assignee:
Siemens Aktiengesellschaft, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
438692 ; 438700 ; 438706 ;
Abstract
An improved hard mask is provided to reduced pad erosion during semiconductor fabrication. The hard mask includes an etch stop layer between first and second hard mask layers.