Robert M Haney

Title: Innovations of Robert M Haney

Introduction

Robert M Haney is a notable inventor based in Mountain View, CA, with a focus on advancements in plasma processing technology. He holds two patents that contribute significantly to the field of semiconductor manufacturing. His work emphasizes the importance of precision and stability in plasma processing chambers.

Latest Patents

Haney's latest patents include methods for plasma matching between different chambers and plasma stability monitoring and control. These methods utilize a calibrated spectrometer to measure plasma attributes in both reference and sample chambers. By correlating process parameters to the plasma optical emission spectra, adjustments can be made to ensure that the processed substrate matches that of the reference chamber. Additionally, he has developed a sloped substrate support designed to contact the substrate primarily at its edge. This innovative design reduces the risk of scratches on the substrate, ultimately improving yield.

Career Highlights

Throughout his career, Haney has made significant contributions to the field of semiconductor processing. His work at Applied Materials, Inc. has positioned him as a key player in the development of advanced manufacturing techniques. His patents reflect a deep understanding of the complexities involved in plasma processing and the need for innovative solutions.

Collaborations

Haney has collaborated with notable colleagues, including David S Ballance and Benjamin B Bierman, to further enhance the capabilities of plasma processing technologies. Their combined expertise has led to advancements that benefit the semiconductor industry.

Conclusion

Robert M Haney's contributions to plasma processing technology through his patents and collaborative efforts highlight his role as an influential inventor in the semiconductor field. His innovations continue to pave the way for improved manufacturing processes and enhanced substrate yields.