Robert K Lewis

Title: The Innovations of Robert K. Lewis

Introduction

Robert K. Lewis is a notable inventor based in Wappingers Falls, NY. He has made significant contributions to the field of semiconductor technology, particularly in the manufacturing processes of large scale integrated devices. With a total of 2 patents to his name, Lewis has demonstrated a commitment to advancing technology through innovative solutions.

Latest Patents

Lewis's latest patents include a method for the control of large scale topography on silicon wafers. This method focuses on characterizing large scale wafer topography to improve yields in the manufacture of large scale integrated (LSI) devices. The process involves measuring heights at various points on the wafer and computing values that correlate with device performance and yield. Another significant patent addresses the process for inhibiting metal migration during heat cycling of multilayer structures. This innovation aims to suppress the formation of metal oxide contaminants on thin metal films by controlling the ambient gas during heat cycling.

Career Highlights

Throughout his career, Robert K. Lewis has been associated with the International Business Machines Corporation (IBM). His work has been instrumental in enhancing the efficiency and reliability of semiconductor manufacturing processes. His innovative approaches have contributed to the advancement of technology in the industry.

Collaborations

Lewis has collaborated with several talented individuals, including Joanne M. Davidson and George Hrebin, Jr. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Robert K. Lewis is a distinguished inventor whose work has significantly impacted the semiconductor industry. His innovative patents and collaborations reflect his dedication to improving technology and manufacturing processes.