This inventor holds 5 USPTO granted patents. Top assignee: Xerox Corporation. Active years: 1985-1996.
Company Filing History:

Years Active: 1985-1996
Title: The Innovative Contributions of Robert J Nash
Introduction
Robert J Nash is a notable inventor based in Webster, NY (US), recognized for his significant contributions to the field of developer compositions. With a total of 5 patents to his name, Nash has made strides in enhancing the functionality and efficiency of developer materials used in various applications.
Latest Patents
Nash's latest patents include innovative formulations that improve the performance of developer compositions. One of his notable inventions is the "Insulative magnetic brush developer compositions," which comprises resin particles, pigment particles, wax component particles, compatibilizer, and a surface additive mixture. This mixture includes metal salts of fatty acids, silica particles, and metal oxide particles, resulting in a developer with a conductivity ranging from about 10-14 to about 10-16 (ohm-cm)-1. Another significant patent is the "Conductive developer compositions with surface additives," which features negatively charged toner particles made from crosslinked polyester resin particles and a carefully balanced mixture of surface additives.
Career Highlights
Nash has dedicated his career to advancing the technology behind developer compositions. He works at Xerox Corporation, a leading company in the field of imaging and printing solutions. His work has contributed to the development of more efficient and effective developer materials, which are crucial for high-quality printing.
Collaborations
Throughout his career, Nash has collaborated with talented individuals such as Cheryl A Hanzlik and Richard N Muller. These collaborations have fostered innovation and have led to the successful development of new technologies in the field.
Conclusion
Robert J Nash's contributions to the field of developer compositions highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving the efficiency and effectiveness of developer materials, making a lasting impact in the industry.