Robert G Boehm, Jr

Title: The Innovations of Robert G Boehm, Jr.

Introduction

Robert G Boehm, Jr. is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of chemical mechanical polishing, particularly in the semiconductor industry. With a total of 2 patents, his work has advanced the technology used in this critical manufacturing process.

Latest Patents

Boehm's latest patents include a "Method and apparatus for stabilizing the process temperature during chemical mechanical polishing." This invention features a temperature compensating unit that is coupled to a linearly moving belt of a polisher. The unit adjusts the temperature of the belt, which is measured by a sensor situated proximal to the belt. Another significant patent is the "Apparatus and method for performing end point detection on a linear planarization tool." This technique utilizes a sensor to monitor fluid pressure from a fluid bearing located under a polishing pad to detect a polishing end point. The sensor, located at the leading edge of a fluid bearing of a linear polisher, is essential for performing chemical-mechanical polishing on a semiconductor wafer.

Career Highlights

Robert G Boehm, Jr. is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to focus on innovations that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Boehm has collaborated with notable colleagues such as Anil K Pant and Wilbur C Krusell. Their combined expertise has contributed to the development of advanced technologies in the field.

Conclusion

Robert G Boehm, Jr. is a distinguished inventor whose contributions to chemical mechanical polishing have had a lasting impact on the semiconductor industry. His innovative patents and collaborations continue to drive advancements in this essential technology.