Hubbardston, MA, United States of America

Robert F Blacksmith


Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 83(Granted Patents)


Company Filing History:


Years Active: 2002-2003

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2 patents (USPTO):

Title: The Innovations of Robert F Blacksmith

Introduction

Robert F Blacksmith is a notable inventor based in Hubbardston, MA (US). He has made significant contributions to the field of antireflective coating compositions, particularly for short wavelength imaging applications. With a total of two patents to his name, Blacksmith's work has advanced the technology used in various imaging processes.

Latest Patents

Blacksmith's latest patents include innovative compositions and methods for antireflective coatings. The first patent focuses on antireflective coating compositions and exposure methods under 200 nm. This invention provides new light-absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly effective for short wavelength imaging applications such as 193 nm. The ARCs developed in this patent are designed to be used with an overcoated resist layer and comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation. The second patent also addresses methods utilizing these antireflective coating compositions with exposure under 200 nm, reinforcing the importance of his work in this specialized area.

Career Highlights

Robert F Blacksmith is currently employed at Shipley Company, L.L.C., where he continues to innovate and develop new technologies. His expertise in antireflective coatings has positioned him as a key player in the field, contributing to advancements that benefit various imaging applications.

Collaborations

Some of Blacksmith's notable coworkers include Timothy G Adams and Edward K Pavelchek. Their collaboration has likely fostered an environment of innovation and creativity, further enhancing the development of new technologies in their field.

Conclusion

Robert F Blacksmith's contributions to the field of antireflective coatings demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in imaging technology and provide solutions that are both practical and effective.

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