The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2002
Filed:
Sep. 15, 1998
Applicant:
Inventors:
Timothy G. Adams, Sudbury, MA (US);
Edward K. Pavelchek, Stow, MA (US);
Roger F. Sinta, Woburn, MA (US);
Manuel DoCanto, Stoughton, MA (US);
Robert F. Blacksmith, Hubbardston, MA (US);
Peter Trefonas, III, Medway, MA (US);
Assignee:
Shipley Company, L.L.C., Marlborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 5/00 ; G03F 7/26 ; G03F 7/09 ;
U.S. Cl.
CPC ...
G03C 5/00 ; G03F 7/26 ; G03F 7/09 ;
Abstract
The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.