Company Filing History:
Years Active: 1980-1985
Title: The Innovations of Robert E. Rinehart
Introduction
Robert E. Rinehart is a notable inventor based in Newtown, Connecticut, with a focus on advancements in photoresist formulations and thermoplastic elastomeric blends. He holds two patents that showcase his innovative contributions to the field of materials science.
Latest Patents
Rinehart's latest patents include a low striation positive diazoketone resist composition, which presents a novel photoresist formulation. This formulation is designed to provide low striations and excellent wetting properties, making it suitable for application by spin casting on various substrates used in integrated circuit manufacture. The essential component of this invention is the solvent composition, which consists of cyclopentanone or a cyclopentanone-cyclohexanone blend, combined with an aliphatic alcohol containing 5-12 carbon atoms. These solvent components, when used in specific ratios, yield unexpectedly good wetting of various substrates and low striation films. Additionally, he has developed a thermoplastic elastomeric blend of monoolefin copolymer rubber, further demonstrating his expertise in material innovation.
Career Highlights
Throughout his career, Rinehart has worked with prominent companies such as Uniroyal Inc. and Allied Corporation. His experience in these organizations has contributed to his development of innovative materials and formulations.
Collaborations
Rinehart has collaborated with notable coworkers, including James M. Lewis and Robert A. Owens, who have contributed to his projects and innovations.
Conclusion
Robert E. Rinehart's contributions to the field of materials science through his patents and collaborations highlight his significant role as an inventor. His work continues to influence advancements in photoresist formulations and thermoplastic elastomeric blends.