The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 1985

Filed:

May. 23, 1983
Applicant:
Inventors:

James M Lewis, Williamsville, NY (US);

Robert A Owens, East Amherst, NY (US);

Richard F Sweeney, Elma, NY (US);

Ronald W Wake, West Seneca, NY (US);

Robert E Rinehart, Newtown, CT (US);

Assignee:

Allied Corporation, Morris Township, Morris County, NJ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G03F / ;
U.S. Cl.
CPC ...
430191 ; 430165 ; 430169 ; 430192 ; 430193 ; 430326 ;
Abstract

A novel photoresist formulation is provided which provides low striations and excellent wetting properties. The photoresist composition may be applied by spin casting on various substrates used in integrated circuit manufacture. The essential component in this invention is the solvent composition which consists of cyclopentanone (or cyclopentanone-cyclohexanone blend) in combination with an aliphatic alcohol of 5-12 carbon atoms. These solvent components when used in certain specific ratios provide unexpectedly good wetting of various substrates and low striation films.


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