Company Filing History:
Years Active: 1977-1985
Title: An Insight into Inventor Richard F. Sweeney
Introduction
Richard F. Sweeney, an accomplished inventor based in Elma, NY, holds an impressive portfolio of 17 patents. His innovative contributions primarily focus on advancements in photoresist formulations and chemical production methods, significantly impacting various fields, particularly in integrated circuit manufacture.
Latest Patents
Among his latest patents, Richard F. Sweeney has developed a novel photoresist formulation known as **Low striation positive diazoketone resist composition with cyclic**. This innovative composition is engineered to provide low striations and excellent wetting properties when applied via spin casting on different substrates used in integrated circuits. The key to this invention lies in its solvent composition, which includes cyclopentanone or a cyclopentanone-cyclohexanone blend, combined with an aliphatic alcohol comprising 5-12 carbon atoms. The specific ratios of these components yield unexpectedly good wetting capabilities and minimal striation in films.
Another notable patent is the **Method for the production of hexafluoro-2,3-bis(trifluoromethyl)-2-butene**. This innovative method entails heating 2,2,4,4-tetrakis-(trifluoromethyl)-1,3-dithietane at elevated temperatures in the presence of activated carbon, serving as a desulphurization catalyst.
Career Highlights
Richard has had a distinguished career, including pivotal roles at prominent companies such as Allied Chemical Corporation and Allied Corporation. His work in these organizations has contributed significantly to the technological advancements in his field.
Collaborations
Throughout his career, Richard F. Sweeney has collaborated with esteemed colleagues, including Bernard F. Sukornick and Louis G. Anello. These partnerships have undoubtedly fostered innovative ideas and advancements, enriching the scientific community.
Conclusion
In conclusion, Richard F. Sweeney's innovative spirit and commitment to excellence have led to a remarkable collection of patents that advance technology and manufacturing processes. His contributions not only reflect his personal dedication but also serve as an inspiration for future inventors seeking to make impactful changes in their respective fields.