Location History:
- Mesa, AZ (US) (2001)
- Apache Junction, AZ (US) (2001)
Company Filing History:
Years Active: 2001
Title: Innovations by Robert Dwayne Colclasure, Jr.
Introduction
Robert Dwayne Colclasure, Jr. is a notable inventor based in Mesa, AZ (US). He has made significant contributions to the field of semiconductor manufacturing, holding 2 patents that showcase his innovative approach to photomask automation and photolithography processes.
Latest Patents
Colclasure's latest patents include a "Method for automating manufacture of photomask" and "Multi-layer registration control for photolithography processes." The first patent describes a computer system that automates the manufacture of photomasks. This system features a product database that stores essential information for photomask production. It also facilitates the manufacturing of semiconductor devices by transmitting data from various semiconductor satellite systems, including fabrication facilities and mask shops. The system intelligently selects a mask shop for photomask production based on the transmitted information.
The second patent introduces a multi-level registration control system for photolithography processes. This system utilizes a photolithography device to print multiple layers on a wafer. It incorporates overlay marks to define errors between layers and employs an overlay measurement device to generate signals for alignment corrections. By using a single overlay mark for alignment, this system effectively reduces the scribe grid area and conserves valuable silicone surface area.
Career Highlights
Colclasure is currently associated with Motorola Corporation, where he applies his expertise in semiconductor technology. His work has significantly impacted the efficiency and accuracy of photomask manufacturing processes.
Collaborations
Colclasure has collaborated with notable colleagues, including Gong Chen and Wayne M Paulson, contributing to advancements in semiconductor technology.
Conclusion
Robert Dwayne Colclasure, Jr. is a distinguished inventor whose work in automating photomask manufacturing and enhancing photolithography processes has made a lasting impact on the semiconductor industry. His innovative patents reflect his commitment to advancing technology in this critical field.