The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2001
Filed:
Mar. 02, 1998
David Kerszykowski, Chandler, AZ (US);
Robert Dwayne Colclasure, Jr., Mesa, AZ (US);
John Michael Garbayo, Mesa, AZ (US);
Raymond Leo Miller, Jr., Gilbert, AZ (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
A computer system (,) and method for automating manufacture of a photomask. The computer system (,) has a product database (,) that stores information used to manufacture the photomask. In addition, a semiconductor device is manufactured using the information stored in the product database (,). The information is transmitted to the product database (,) from semiconductor satellite systems such as a fabrication facility (,), a first mask shop (,), and a second mask shop (,). The computer system (,) chooses a mask shop for producing the photomask by using the information transmitted form the first mask shop (,) and the second mask shop (,).