Company Filing History:
Years Active: 2001
Title: John Michael Garbayo: Innovator in Photomask Manufacturing
Introduction
John Michael Garbayo is a notable inventor based in Mesa, AZ (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the automation of photomask production. His innovative approach has led to the development of a unique method that enhances efficiency in this critical area of technology.
Latest Patents
Garbayo holds a patent for a "Method for automating manufacture of photomask." This invention involves a computer system designed to automate the manufacturing process of photomasks. The system features a product database that stores essential information used in the photomask production. Additionally, it facilitates the manufacturing of semiconductor devices by utilizing the data stored in the product database. The information is transmitted from semiconductor satellite systems, including fabrication facilities and multiple mask shops. The computer system intelligently selects a mask shop for photomask production based on the information received from these sources. Garbayo's patent represents a significant advancement in the automation of semiconductor manufacturing processes, with 1 patent to his name.
Career Highlights
Throughout his career, Garbayo has been associated with Motorola Corporation, where he has contributed to various projects and innovations. His work has been instrumental in improving manufacturing processes and enhancing product quality in the semiconductor industry.
Collaborations
Garbayo has collaborated with several talented individuals, including David Kerszykowski and Robert Dwayne Colclasure, Jr. These collaborations have fostered a creative environment that has led to innovative solutions in the field of semiconductor manufacturing.
Conclusion
John Michael Garbayo's contributions to the automation of photomask manufacturing highlight his role as an influential inventor in the semiconductor industry. His innovative methods and collaborative efforts continue to shape the future of technology in this field.