Robert Champetier

Title: The Innovations of Robert Champetier

Introduction

Robert Champetier is an accomplished inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of measurement technology, particularly in the area of curvature and thin film stress measurement. His innovative approach has led to the development of a unique apparatus that enhances the accuracy of these measurements.

Latest Patents

Robert Champetier holds a patent for an "Apparatus and method for curvature and thin film stress measurement." This invention discloses a system that comprises two light sources and a detector. The apparatus utilizes two light beams from the light sources that are not parallel and are projected onto a specimen. The curvature of the specimen is calculated based on the distance between the spots of the light beams on the detector or the size variation of one of the spots. This innovative method allows for precise measurements that are crucial in various applications.

Career Highlights

Robert Champetier is currently associated with Hermes-Epitek Corporation, where he continues to work on advancing measurement technologies. His expertise and innovative mindset have positioned him as a valuable asset to the company and the industry at large.

Collaborations

Throughout his career, Robert has collaborated with notable colleagues, including Chung-Yuan Wu and Chung-Hua Fu. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Robert Champetier's contributions to measurement technology exemplify the spirit of innovation. His patent for curvature and thin film stress measurement showcases his ability to solve complex problems through inventive solutions. His work continues to influence the field and inspire future advancements.