This inventor holds 1 USPTO granted patent. Top assignees: National Technology & Engineering Solutions of Sandia, LLC, The Government of the United States as Represented by the Director, National Security Agency. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 1,085 
1 out of 24 Years Active: 2026
Title: The Innovative Contributions of Robert Butera
Introduction
Robert Butera is a notable inventor based in Prince Frederick, MD (US). He has made significant contributions to the field of atomic layer deposition (ALD) technology. With a total of 1 patents, his work has advanced the capabilities of material processing at the nanoscale.
Latest Patents
One of Robert Butera's key patents is titled "Area selective deposition templated by hydrogen and halogen resists." This patent discloses a process for area selective atomic layer deposition at the near atomic scale, specifically below 10 nm. The process involves cleaning a substrate surface and terminating it with hydrogen. A pattern is then written on the hydrogen-terminated surface using scanning tunneling microscope lithography. The depassivated regions are exposed to a halogen flux, while the passivated regions undergo a functionalization process to create functionalized areas. The roles of hydrogen and halogen can be inverted to change the tone of the pattern. The substrate is subsequently subjected to the ALD process, allowing growth only in the non-functionalized regions. Optionally, selective etching can be performed to remove the functionalized regions and the underlying substrate portions.
Career Highlights
Throughout his career, Robert Butera has worked with esteemed organizations, including the Government of the United States as represented by the Director of the National Security Agency and National Technology & Engineering Solutions of Sandia, LLC. His expertise in ALD technology has positioned him as a valuable asset in these institutions.
Collaborations
Robert Butera has collaborated with notable colleagues such as Scott William Schmucker and Esther Frederick. Their combined efforts have contributed to advancements in their respective fields.
Conclusion
Robert Butera's innovative work in atomic layer deposition technology has made a lasting impact on material science. His patents and collaborations reflect his dedication to advancing technology at the nanoscale.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile