This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Robert Bastiaan Clark De Korte: Lithographic Performance Qualification
Introduction
Robert Bastiaan Clark De Korte is an inventor associated with Eindhoven, the Netherlands. His patent work concerns lithographic performance qualification, a process for assessing exposure performance using monitored parameters.
Latest Patents
De Korte is associated with 1 patent: “Lithographic Performance Qualification and Associated Apparatuses.” The invention describes a method for testing lithographic performance. It obtains one or more exposure layouts for exposing multiple fields on a substrate, then performs a dummy exposure on a photoresist-coated substrate. The dummy exposure uses no illumination or illumination below the photoresist’s exposure threshold. The method monitors exposure parameters and evaluates the performance of each dummy exposure and its corresponding layout using the resulting data.
Career Highlights
De Korte is associated with ASML Netherlands B.V., a company working in lithography systems and related technologies. His patent reflects an approach to evaluating exposure layouts without carrying out a conventional, resist-exposing process.
Collaborations
His listed coworker is Alina Nicoleta Tarau. The available information identifies their professional association but does not specify the details of their collaboration.
Conclusion
Robert Bastiaan Clark De Korte’s patent focuses on a practical method for qualifying lithographic performance through controlled dummy exposures and exposure-parameter analysis.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile