Company Filing History:
Years Active: 1997-2001
Title: **The Innovations of Robert B. Lipori**
Introduction
Robert B. Lipori is a notable inventor based in Stamford, CT, recognized for his contributions to the field of chemical-mechanical polishing. With two patents to his name, Lipori has demonstrated a commitment to innovation in fluid collection and monitoring technologies within semiconductor manufacturing processes.
Latest Patents
Lipori's latest patents include:
1. **Accumulator for Slurry Sampling**: This invention features a fluid collection apparatus designed to contact a polishing surface of a polishing pad and collect fluid efficiently. It includes a reservoir for receiving the fluid from the accumulator and a volume maintainer to ensure a consistent volume of fluid is retained in the reservoir.
2. **Rotary Signal Coupling for Chemical Mechanical Polishing Endpoint**: This patent involves a rotary signal coupling system utilized for in-situ monitoring of the chemical-mechanical polishing process. A sensor mounted on a rotatable wafer carrier creates a signal reflective of the polishing process, which is transmitted through a rotary transformer setup. This system enhances the precision of process monitoring, providing valuable data for operational improvement.
Career Highlights
Robert B. Lipori is associated with International Business Machines Corporation (IBM), where he has been instrumental in pioneering advancements in polishing technology. His work significantly influences the semiconductor manufacturing sector, ensuring high precision and efficiency through his innovative designs.
Collaborations
During his career, Lipori has worked alongside notable colleagues, including Leping Li and William Joseph Surovic. Their collaborative efforts have contributed to the successful development of innovative technologies in their respective fields.
Conclusion
Robert B. Lipori exemplifies the spirit of innovation with his patents that cater to the specialized needs of the semiconductor industry. His contributions not only reflect his ingenuity but also enhance the operational capabilities of the technologies employed in chemical-mechanical polishing processes. As he continues his work at IBM, Lipori remains a key figure in advancing the future of precision polishing technologies.
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