Robert B Hixson

Title: The Innovative Contributions of Robert B. Hixson

Introduction

Robert B. Hixson is a notable inventor based in Portland, Oregon. He has made significant contributions to the field of substrate processing technology, holding a total of 4 patents. His work has been instrumental in advancing the efficiency and effectiveness of physical vapor deposition systems.

Latest Patents

Hixson's latest patents include a "Shield assembly for substrate processing chamber" and a "Physical vapor deposition apparatus with modified shutter disk and cover ring." The shielding assembly is designed to facilitate sputtering and evaporation processes while preventing target material from depositing on the internal surfaces of the chamber. This innovative construction allows for easy uncoupling from an adapter plate without the need for removal from the deposition chamber. The physical vapor deposition system features an upper and lower shield, a cover ring with radially extending tabs, and a shutter disk with notched areas. These enhancements enable the use of a standard shutter arm assembly in a two-tab block-out scheme, improving the overall functionality of the system.

Career Highlights

Throughout his career, Hixson has worked with several prominent companies, including Integrated Device Technology, Inc. and Tosoh. His experience in these organizations has contributed to his expertise in substrate processing technologies and patent development.

Collaborations

Hixson has collaborated with notable professionals in his field, including Gary William Groshong and Jose Luis Gonzalez. These partnerships have further enriched his work and innovations.

Conclusion

Robert B. Hixson's contributions to substrate processing technology and his innovative patents have made a lasting impact in the industry. His work continues to influence advancements in physical vapor deposition systems, showcasing his dedication to innovation and excellence.