Company Filing History:
Years Active: 2006
Title: The Innovative Mind of Robert A. Calderoni
Introduction: Robert A. Calderoni, an inventive mind hailed from Fairfield, Vermont, has made significant strides in technology with his innovative approach to detecting plasma leakage. His work primarily involves enhancing the efficiency and reliability of reactive ion etching processes crucial in semiconductor manufacturing.
Latest Patents: Robert A. Calderoni holds a patent for a method and system designed to detect abnormal plasma discharge in a reactive ion etching (RIE) chamber. This technology is instrumental in identifying plasma leakage, which can affect the precision of etching processes. The patented system utilizes electrical contacts to provide an input signal generated by a radio frequency (RF) generator, with a variable power controller that gradually ramps up the power supplied to the chamber, improving monitoring capabilities.
Career Highlights: Currently employed at International Business Machines Corporation (IBM), Robert has contributed his expertise to advancing the field of semiconductor processing. His innovative solutions help in ensuring that processes remain efficient and effective, significantly impacting the overall manufacturing landscape.
Collaborations: Throughout his career, Robert has collaborated with talented individuals such as June Cline and Kellie L. Dutra, whose combined efforts have facilitated the development of cutting-edge technologies in their respective fields.
Conclusion: Robert A. Calderoni stands out as a remarkable inventor whose contributions to plasma leakage detection in reactive ion etching chambers reflect a deep commitment to innovation. His patent not only underscores his ingenuity but also exemplifies the collaborative spirit that drives progress in advanced technology sectors.