The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2006
Filed:
Feb. 02, 2004
Robert A. Calderoni, Fairfield, VT (US);
June Cline, South Burlington, VT (US);
Kellie L. Dutra, Essex Junction, VT (US);
Ronald G. Meunier, Essex Junction, VT (US);
Joseph P. Walko, Jericho, VT (US);
Justin Wai-chow Wong, South Burlington, VT (US);
Robert A. Calderoni, Fairfield, VT (US);
June Cline, South Burlington, VT (US);
Kellie L. Dutra, Essex Junction, VT (US);
Ronald G. Meunier, Essex Junction, VT (US);
Joseph P. Walko, Jericho, VT (US);
Justin Wai-chow Wong, South Burlington, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Disclosed is a method and system for detecting abnormal plasma discharge that is useful in, for example, detecting plasma leakage in a reactive ion etching (RIE) chamber. The system includes electrical contacts connected to the chamber that provide an input signal to the chamber. This input signal can be generated by a radio frequency (RF) generator that is connected to the electrical contacts. A variable power controller connected to the RF generator gradually increases (ramps) the power of the input signal being supplied to the chamber.