Essex Junction, VT, United States of America

Kellie L Dutra


Average Co-Inventor Count = 4.8

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2005-2006

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2 patents (USPTO):

Title: Celebrating the Innovations of Kellie L. Dutra in Plasma Technology

Introduction

Kellie L. Dutra is an accomplished inventor based in Essex Junction, Vermont, recognized for her significant contributions to plasma technology. With two patents to her name, her work has advanced methods used in reactive ion etching chambers, showcasing both ingenuity and a commitment to innovation.

Latest Patents

Dutra's latest innovations include two notable patents. The first patent, "Measurement to Determine Plasma Leakage," discloses a method and system for detecting abnormal plasma discharge, specifically useful in identifying plasma leakage within reactive ion etching (RIE) chambers. This system employs electrical contacts that provide an input signal generated by a radio frequency (RF) generator. Additionally, a variable power controller connected to the RF generator gradually increases the power of the input signal supplied to the chamber.

The second patent, "Method of Stabilizing Oxide Etch and Chamber Performance Using Seasoning," addresses undesirable reactions that occur during etching processes. By recognizing the formation of volatile compounds or complexes at the interior surfaces of a reactor chamber, this method minimizes and controls these reactions through the priming of the chamber surface with specific seasoning atoms and/or molecules.

Career Highlights

Dutra's professional journey has led her to work at the prestigious International Business Machines Corporation (IBM), where she applies her expertise in developing cutting-edge solutions in plasma technology. Her contributions are vital in enhancing the performance and efficiency of etching processes, which are crucial in semiconductor manufacturing.

Collaborations

Throughout her career, Kellie L. Dutra has collaborated with esteemed colleagues such as Ronald G. Meunier and Robert A. Calderoni. These partnerships have fostered an environment of creativity and scientific inquiry, contributing further to the innovations that emerge from her team.

Conclusion

Kellie L. Dutra is a trailblazer in the field of plasma technology, with her recent patents showcasing her innovative spirit and dedication to solving complex challenges. Her work at IBM and collaborations with fellow inventors emphasize the importance of teamwork in advancing technology, and her contributions continue to influence the industry positively.

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