The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2005
Filed:
Nov. 05, 2001
Kellie L. Dutra, Essex Junction, VT (US);
Margaret L. Gibson, Underhill, VT (US);
Ronald G. Meunier, Westford, VT (US);
Jason W. Silbergleit, Essex Junction, VT (US);
Kellie L. Dutra, Essex Junction, VT (US);
Margaret L. Gibson, Underhill, VT (US);
Ronald G. Meunier, Westford, VT (US);
Jason W. Silbergleit, Essex Junction, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Undesirable reactions (such as formation of volatile compounds or complexes) are recognized to occur during production processes (such as etching with fluorine) at interior surfaces of a reactor chamber (such as a silicon-based reactor chamber). These undesirable reactions may be minimized and controlled by priming the chamber surface by incorporating seasoning atoms and/or molecules.