Rivka Sherman

Title: Rivka Sherman: Innovator in Optical Inspection Technology

Introduction

Rivka Sherman is a prominent inventor based in Ramat Hasharon, Israel. She has made significant contributions to the field of optical inspection technology, holding a total of six patents. Her innovative work focuses on methods and apparatuses for detecting defects in substrates, particularly in the semiconductor industry.

Latest Patents

Among her latest patents is the "Optical Inspection Apparatus for Substrate Defect Detection." This invention outlines a method for inspecting the surface of articles, such as chips and wafers, for defects. The process includes a first phase of optically examining the complete surface at a relatively high speed and with a relatively low spatial resolution. The second phase involves a more detailed examination of suspected locations with a higher spatial resolution. Another notable patent is the "Optical Inspection Method for Substrate Defect Detection," which shares similar methodologies and objectives in defect detection.

Career Highlights

Rivka has worked with leading companies in the industry, including Applied Materials, Inc. and Applied Materials Israel Limited. Her experience in these organizations has allowed her to refine her skills and contribute to advancements in optical inspection technologies.

Collaborations

Rivka has collaborated with notable professionals in her field, including David Alumot and Gad Neumann. These partnerships have further enhanced her innovative capabilities and expanded her impact on the industry.

Conclusion

Rivka Sherman is a trailblazer in optical inspection technology, with a strong portfolio of patents that reflect her expertise and dedication. Her work continues to influence the semiconductor industry and improve defect detection methods.