Rintaro Higuchi

Title: The Innovative Contributions of Rintaro Higuchi

Introduction

Rintaro Higuchi, a skilled inventor based in Kumamoto, Japan, has made significant strides in the field of substrate processing. With a total of three patents to his name, Higuchi is recognized for his inventive contributions, particularly within the semiconductor manufacturing industry. His latest patents showcase novel methods and apparatus that improve the efficiency and effectiveness of substrate processing.

Latest Patents

Higuchi's latest innovations include a substrate processing method designed to effectively remove liquid from a substrate that features an uneven pattern on its surface. This method involves creating a laminate with a two-layer structure, where the lower layer consists of a first material in a solid state, and the upper layer comprises a second material also in a solid state. The process comprises several steps: first, removing the second material from the concave portions of the pattern through heating, light-emitting, or gas reaction processes, and subsequently applying the same techniques to eliminate the first material.

Additionally, Higuchi has developed a substrate processing apparatus which integrates a substrate rotator, a processing liquid supply, an anode, a cathode, and a controller. The unique feature of this apparatus allows the anode and cathode to contact the processing liquid independently while the substrate rotates, enabling optimized application of voltage across the processing liquid supplied to the substrate.

Career Highlights

Rintaro Higuchi is currently associated with Tokyo Electron Limited, a leading company in the field of semiconductor production equipment. His work has significantly enhanced the methods available for substrate processing, catering to the evolving needs of the semiconductor industry. Higuchi’s patents are crucial for manufacturers aiming to improve their production efficiency and product quality.

Collaborations

Throughout his career, Higuchi has collaborated with notable coworkers, including Koukichi Hiroshiro and Koji Kagawa. These partnerships have contributed to the development of new technologies and innovative solutions, fostering a rich collaborative environment that propels advancements in substrate processing.

Conclusion

Rintaro Higuchi stands out as a prominent inventor in the realm of substrate processing technologies. His inventive spirit and contributions, particularly through his latest patents, reinforce the importance of innovation in the semiconductor industry. With his ongoing work and collaborations, Higuchi is poised to continue making valuable impacts in the field.