Riley E Brandt

Title: The Innovative Contributions of Riley E Brandt

Introduction

Riley E Brandt is a notable inventor based in Simsbury, CT (US). She has made significant contributions to the field of materials science, particularly in the production of thin layers of crystalline or polycrystalline materials. Her innovative methods have implications for the development of optoelectronic devices.

Latest Patents

Riley E Brandt holds a patent for a method titled "Method for producing thin layers of crystalline or polycrystalline materials." This method involves electrochemically etching a crystalline silicon template to create a porous double layer. The double layer consists of a highly porous deeper layer and a less porous shallower layer. The shallower layer is then irradiated with a short laser pulse to recrystallize it, resulting in a crystalline layer. Following this, silicon is deposited on the recrystallized layer and subsequently irradiated to crystallize the silicon, leaving a layer of crystallized silicon on the template. The final step involves separating the layer of crystallized silicon from the template.

Career Highlights

Throughout her career, Riley has worked with prestigious institutions such as Harvard College and the Massachusetts Institute of Technology. Her work has been instrumental in advancing the understanding and application of crystalline materials in technology.

Collaborations

Riley has collaborated with notable individuals in her field, including Mark T Winkler and Tonio Buonassisi. These collaborations have further enriched her research and contributions to materials science.

Conclusion

Riley E Brandt's innovative methods and dedication to her field have made her a significant figure in the development of materials for optoelectronic devices. Her contributions continue to influence advancements in technology and materials science.