Kariya, Japan

Riku Onishi

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Denso Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Riku Onishi. Retrieved from https://idiyas.com/inventor/riku-onishi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Riku Onishi - Innovator in Semiconductor Manufacturing

Introduction

Riku Onishi is a notable inventor based in Kariya, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative approach has led to the development of a unique method for producing semiconductor wafers.

Latest Patents

Riku Onishi holds 1 patent for his invention titled "Method of manufacturing semiconductor wafers." This patent describes a manufacturing method that involves preparing an ingot with a peeling layer formed along its first major surface. The process includes applying a load to the ingot to facilitate the peeling of a wafer precursor, which is crucial for semiconductor production.

Career Highlights

Riku Onishi is currently employed at Denso Corporation, a leading company in the automotive and technology sectors. His work at Denso has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor technology.

Collaborations

Throughout his career, Riku has collaborated with talented individuals such as Sodai Nomura and Tomoki Kawazu. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Riku Onishi's contributions to semiconductor manufacturing exemplify the spirit of innovation. His patented method showcases his expertise and commitment to advancing technology in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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