Nonoichi, Japan

Riku Katamawari

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Kabushiki Kaisha Toshiba, Toshiba Electronic Devices & Storage Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Riku Katamawari. Retrieved from https://idiyas.com/inventor/riku-katamawari

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Riku Katamawari: Innovator in Semiconductor Technology

Introduction

Riku Katamawari is a notable inventor based in Nonoichi, Japan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor device that showcases his expertise and creativity.

Latest Patents

Riku Katamawari holds 1 patent for a semiconductor device. This device includes a lead frame and a semiconductor chip. The lead frame features a frame main surface and a frame convex portion. The semiconductor chip consists of a semiconductor layer and an electrode that is bonded to the frame convex portion. Notably, the electrode has a protrusion that surrounds the frame convex portion, ensuring that the outer side surface of the protrusion is flush with the side surface of the semiconductor layer.

Career Highlights

Throughout his career, Riku has worked with prominent companies in the technology sector. He has been associated with Kabushiki Kaisha Toshiba and Toshiba Electronic Devices & Storage Corporation. His experience in these organizations has contributed to his development as an inventor and innovator in semiconductor technology.

Collaborations

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Conclusion

Riku Katamawari's contributions to semiconductor technology highlight his innovative spirit and dedication to advancing the field. His patent reflects a significant achievement in the industry, showcasing his ability to create effective solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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