This inventor holds 2 USPTO granted patents. Top assignee: Canon Kabushiki Kaisha. Active years: 2014-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014-2015
Title: Rika Takahashi: Innovator in Projection Optical Systems
Introduction
Rika Takahashi is a prominent inventor based in Utsunomiya, Japan. She has made significant contributions to the field of projection optical systems, holding 2 patents that showcase her innovative approach to technology.
Latest Patents
Her latest patents include a method of calculating the amount of fluctuation of imaging characteristics in projection optical systems and an exposure apparatus. This method involves calculating an exposure coefficient for different wavelength bands based on the fluctuation of optical characteristics. The exposure coefficient for a second wavelength band is derived from the first, allowing for precise calculations when substrates are exposed to varying light conditions.
Career Highlights
Rika Takahashi works at Canon Kabushiki Kaisha, a leading company in imaging and optical technologies. Her work has been instrumental in advancing the capabilities of projection systems, which are crucial in various applications, including semiconductor manufacturing.
Collaborations
Rika collaborates with her coworker, Atsushi Shigenobu, to further enhance the development of innovative optical solutions. Their teamwork exemplifies the importance of collaboration in driving technological advancements.
Conclusion
Rika Takahashi's contributions to projection optical systems highlight her role as a key innovator in the field. Her patents reflect her expertise and commitment to advancing technology in imaging systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile