Canon Kabushiki Kaisha

Rika Takahashi

Atsushi Shigenobu

In a case where a substrate is exposed to exposure light of a first wavelength band, an exposure coefficient, which is defined as an amount of fluctuation of an imaging characteristic of a projection optical system per unit of exposure energy, for the first wavelength band is calculated using data of the amount of fluctuation of the optical characteristic of the projection optical system. An exposure coefficient for a second wavelength band that is different from the first wavelength band is calculated using the exposure coefficient for the first wavelength band. In a case where the substrate is exposed to exposure light of the second wavelength band, the amount of fluctuation of the imaging characteristic of the projection optical system is calculated using the exposure coefficient for the second wavelength band.

Method of calculating amount of fluctuation of imaging characteristic of projection optical system, exposure apparatus, and method of fabricating device

Growing community of inventors

Utsunomiya, Japan

Rika Takahashi