Rick C White

Title: Innovations of Rick C White

Introduction

Rick C White is an accomplished inventor based in Nashua, NH (US). He has made significant contributions to the field of semiconductor technology and supercritical fluid cleaning systems. With a total of 2 patents, his work showcases innovative methods and apparatuses that enhance manufacturing processes.

Latest Patents

One of Rick's latest patents is titled "Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom." This invention utilizes a supercritical fluid cleaning system that operates rotary motors in a chamber with fluid bearings and fluid load levitation. The system is designed to improve the cleaning process by enhancing agitation and mass transfer of fluid to the processed surface. Additionally, it features non-contact, fluid-operated rotating mechanisms that reduce contamination, thereby improving the overall efficiency of the cleaning process.

Another notable patent is "Method and apparatus for synthesis and growth of semiconductor crystals." This invention presents an improved method for growing crystals, incorporating an isolation valve between the growth and injection chambers. This design allows the growth chamber to maintain optimal temperature and pressure while enabling necessary adjustments in the injector chamber. The system includes separate heating elements and advanced weighing mechanisms to monitor the dynamic weight of process materials, ensuring precise control over the growth process.

Career Highlights

Rick has worked with G.T. Equipment Technologies Inc., where he applied his expertise in semiconductor technology. His innovative approaches have contributed to advancements in the industry, making him a respected figure among his peers.

Collaborations

Rick has collaborated with notable professionals such as Ijaz H Jafri and Mohan Chandra, further enhancing his contributions to the field.

Conclusion

Rick C White's innovative patents and career achievements reflect his dedication to advancing technology in semiconductor manufacturing and cleaning processes. His work continues to influence the industry and inspire future innovations.