Richard Yen-chang Yang

Title: Innovations by Richard Yen-chang Yang

Introduction

Richard Yen-chang Yang is a notable inventor based in Fremont, CA. He has made significant contributions to the field of plasma processing technology. With a total of 2 patents, his work focuses on improving etch and deposition uniformity in semiconductor manufacturing.

Latest Patents

Yang's latest patents include a method and apparatus for enhancing etch and deposition uniformity in plasma processing systems. This innovative system features a plasma processing chamber equipped with a substrate support and a dielectric member. The design allows for the concentration of a secondary gas near the substrate's periphery, which improves uniformity across the substrate surface. Another patent involves a multi-step metallization etch method that utilizes specific flow ratios of etchant gases to achieve precise etching through metallization layers in a wafer's layer stack.

Career Highlights

Richard Yang is currently employed at Lam Research Corporation, a leading company in semiconductor manufacturing equipment. His expertise in plasma processing has been instrumental in advancing the technology used in the industry.

Collaborations

Yang has collaborated with notable colleagues such as Vikram Singh and Brian K McMillin, contributing to various projects within the company.

Conclusion

Richard Yen-chang Yang's innovative patents and contributions to plasma processing technology highlight his importance in the semiconductor industry. His work continues to influence advancements in manufacturing processes.