Richard W Gregor

Title: The Innovations of Richard W. Gregor

Introduction

Richard W. Gregor is a notable inventor based in Allentown, PA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work primarily focuses on improving fabrication processes in integrated circuits.

Latest Patents

Among his latest patents is a flash EEPROM fabrication process that utilizes a selective wet chemical etch. This method involves forming a pair of spacers over a polysilicon substrate, followed by the creation of a second pair of spacers from doped silicon dioxide. The second pair of spacers is then etched away using NH₄OH/H₂O₂, allowing for the definition of the underlying polysilicon layer. Another significant patent involves a method of semiconductor integrated circuit manufacturing that reduces defect density in a semiconductor process sequence. This is achieved by employing an approximately 1:1 ratio of nitride to oxide thickness in the second local oxidation step, along with an annealing step.

Career Highlights

Richard W. Gregor has had a distinguished career at AT&T Bell Laboratories, where he has been instrumental in advancing semiconductor technologies. His innovative approaches have contributed to the efficiency and effectiveness of integrated circuit manufacturing processes.

Collaborations

One of his notable coworkers is Chung W. Leung, with whom he has collaborated on various projects within the semiconductor field.

Conclusion

Richard W. Gregor's contributions to semiconductor technology through his patents and work at AT&T Bell Laboratories highlight his role as a significant figure in the field of innovation. His advancements continue to influence the manufacturing processes of integrated circuits today.