Richard Mars Ruggiero

Title: Richard Mars Ruggiero: Innovator in Chemical Mechanical Polishing Technology

Introduction

Richard Mars Ruggiero is a notable inventor based in Danbury, CT (US). He has made significant contributions to the field of chemical mechanical polishing, particularly through his innovative patent. His work is recognized for enhancing the efficiency and effectiveness of polishing processes in various applications.

Latest Patents

Ruggiero holds a patent for a "Rotary signal coupling for chemical mechanical polishing endpoint." This invention provides an apparatus for rotary signal coupling in in-situ monitoring of a chemical-mechanical polishing process. The apparatus includes a sensor fixed to a rotatable wafer carrier, which creates a signal responsive to the polishing process. A conductor is coupled to the sensor for receiving the signal, and this conductor is also fixed to the rotatable wafer carrier. Additionally, a contact coupled to the conductor is fixed to a stationary drive arm, and signal transfer means are coupled to the contact for transferring the signal to a monitoring means. This innovative approach enhances the monitoring capabilities during the polishing process.

Career Highlights

Richard Mars Ruggiero is associated with the International Business Machines Corporation (IBM), where he has contributed to various projects and innovations. His expertise in chemical mechanical polishing has positioned him as a valuable asset within the company.

Collaborations

Ruggiero has collaborated with notable colleagues, including Leping Li and Steven G Barbee. These collaborations have furthered advancements in the field and contributed to the success of their projects.

Conclusion

Richard Mars Ruggiero's contributions to the field of chemical mechanical polishing through his innovative patent demonstrate his commitment to advancing technology. His work at IBM and collaborations with esteemed colleagues highlight his role as a significant inventor in this specialized area.