The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 1998

Filed:

Mar. 19, 1996
Applicant:
Inventors:

Leping Li, Poughkeepsie, NY (US);

Steven George Barbee, Dover Plains, NY (US);

Arnold Halperin, Cortlandt Manor, NY (US);

Richard Mars Ruggiero, Danbury, CT (US);

William Joseph Surovie, Carmel, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; G01B / ;
U.S. Cl.
CPC ...
324226 ; 324234 ; 324 715 ; 1566261 ; 1566271 ;
Abstract

An apparatus for rotary signal coupling in in-situ monitoring of a chemical-mechanical polishing process by a polisher is provided with a sensor fixed to a rotatable wafer carrier for creating a signal responsive to the chemical mechanical polishing process, a conductor coupled to the sensor for receiving the signal, the conductor fixed to the rotatable wafer carrier, a contact coupled to the conductor, the contact fixed to a stationary drive arm, and signal transfer means coupled to the contact for transferring the signal to a monitoring means.


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