Richard M Schroedl

Title: The Innovative Contributions of Richard M Schroedl

Introduction

Richard M Schroedl is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of technology, holding a total of 3 patents. His work primarily focuses on advancements in stencil mask technology and visual measurement techniques.

Latest Patents

One of his latest patents is titled "Stencil mask with channels including depressions." This invention enhances the structural integrity of stencil masks by controlling the positioning of mesh side features. It also eliminates unnecessary design side channels and mesh side via openings, leading to improved performance. Another significant patent is "Visual measurement technique and test pattern for aperture offsets." This patent introduces a test pattern that allows for the determination of dimensions for alignment correction through visual inspection, rather than relying on complex stationary optical instruments.

Career Highlights

Throughout his career, Richard has worked with prominent companies, including IBM and International Business Machines Corporation. His experience in these organizations has contributed to his expertise and innovative capabilities in the field.

Collaborations

Richard has collaborated with notable individuals such as Donald G Will and Reena G Malangone. These partnerships have likely fostered a creative environment that has led to the development of his patents.

Conclusion

Richard M Schroedl's contributions to technology through his patents demonstrate his innovative spirit and dedication to advancing the field. His work continues to influence the industry and inspire future inventors.