The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 1994
Filed:
Oct. 29, 1991
William I Doxsey, Poughkeepsie, NY (US);
John J Masten, Jr, deceased, late of Poughkeepsie, NY (US);
Richard M Schroedl, Wappingers Falls, NY (US);
Donald G Will, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A test pattern including an aperture image and a line image including a plurality of parallel lines, forming a measurement graticule, overlapping the aperture image, permits determination of dimensions for correction of alignment of image centerlines by inspection rather than complex measurement with stationary optical instruments. Since the line pattern preferably includes a plurality of parallel lines of predetermined width and separated by a predetermined spacing, the line image can be made to overlie the aperture image without obscuring features of the aperture image which are significant to determination of the alignment correction dimension.