Company Filing History:
Years Active: 1996-2004
Title: The Innovative Contributions of Richard LaPeruta, Jr.
Introduction
Richard LaPeruta, Jr. is a notable inventor based in Lititz, PA (US), recognized for his significant contributions to technology through his innovative patents. With a total of 11 patents to his name, LaPeruta has made strides in the field of tension masks, which are crucial in various electronic applications.
Latest Patents
Among his latest patents is a method and apparatus for maintaining mask strand spatial uniformity. This invention focuses on ensuring consistent spacing between tension mask strands, which is essential for the functionality of tension masks. The process involves providing a tension mask with connecting strands and attaching barrier ridge elements to one side of these strands. The tension mask is then tensioned and affixed to a mask frame, creating a complete mask frame assembly. Another significant patent is the method and apparatus for maintaining spacing between tension focus mask strands. This invention details a process that includes applying a permanent adhesive to the screen-side of the mask strands and utilizing non-permanent horizontal guide members to maintain vertical spacing during the application of crosswires and subsequent thermal processing.
Career Highlights
LaPeruta has worked with prominent companies such as Thomson Consumer Electronics Inc. and Thomson Licensing S.a. His experience in these organizations has contributed to his expertise in developing innovative solutions in the field of electronics.
Collaborations
Throughout his career, LaPeruta has collaborated with talented individuals, including Edward Richard Garrity, Jr. and Brian Thomas Collins. These collaborations have likely enriched his work and led to the development of groundbreaking technologies.
Conclusion
Richard LaPeruta, Jr. stands out as an influential inventor whose work in tension masks has advanced the field of electronics. His innovative patents and collaborations reflect his commitment to technological progress and excellence.